Nano-lithography
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Nano-lithography

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Published by ISTE, Wiley in London, UK, Hoboken, NJ .
Written in English

Subjects:

  • Nanotechnology,
  • Microlithography

Book details:

Edition Notes

Includes bibliographical references and index.

Statementedited by Stefan Landis
Classifications
LC ClassificationsTK7872.M3 N3613 2011
The Physical Object
Paginationxxv, 325 p. :
Number of Pages325
ID Numbers
Open LibraryOL24881665M
ISBN 101848212119
ISBN 109781848212114
LC Control Number2010046516
OCLC/WorldCa642840091

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This book addresses physical principles as well as the scientific and technical challenges of nanolithography, covering X-ray and NanoImprint lithography, as well as techniques using scanning probe microscopy and the optical properties of metal nanostructures, patterning with block copolymers, and metrology for lithography.   It is used in the fabrication of leading-edge semiconductor integrated circuits (nanocircuitry) or nanoelectromechanical systems (NEMS).This book addresses physical principles as well as the scientific and technical challenges of nanolithography, covering X-ray and NanoImprint lithography, as well as techniques using scanning probe microscopy and the optical properties of metal nanostructures, patterning with block copolymers, and metrology for : Stefan Landis. Download Nanolithography Book PDF. Download full Nanolithography books PDF, EPUB, Tuebl, Textbook, Mobi or read online Nanolithography anytime and anywhere on any device. Get free access to the library by create an account, fast download and ads free. We cannot guarantee that every book is .   Help us write another book on this subject and reach those readers. Suggest a book topic Books open for submissions. chapter statistics. total chapter downloads. 1 Crossref citations. More statistics for editors and authors. Login to your personal dashboard for more detailed statistics on your publications.

  Jeet is a new member of the GizmoChina team. When not writing about tech, you’ll probably find him binge-watch TV shows/movies or reading books. Sabine Portal, Carles Corbella, in Functional Nanostructured Interfaces for Environmental and Biomedical Applications, Summary. Colloidal lithography has earned its position as one of the most versatile nanopatterning methods within the vast set of nanolithography techniques. CL using plasma as etching or depositing agent constitutes an intrinsically flexible tool to tune surface. Laser-Based Nano Fabrication and Nano Lithography. Koji Sugioka and Ya Cheng (Eds.) Pages: Published: November (This book is a printed edition of the Special Issue Laser-Based Nano Fabrication and Nano Lithography that was published in Nanomaterials) Download PDF. Add this book to .   This book addresses physical principles as well as the scientific and technical challenges of nanolithography, covering X-ray and NanoImprint lithography, as well as techniques using scanning probe microscopy and the optical properties of metal nanostructures, patterning with block copolymers, and metrology for cturer: Wiley-ISTE.

  Book Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology—beyond the current nm-based optical lithography—aiming to manufacture computer chips, and recent progress has been made on several fronts: EUV light sources, scanners, optics, contamination control, masks and mask handling, and resists. In view of the rapid advancement of this field in recent years, this Special Issue aims at introducing the state-of-the-art in nano fabrication and nano lithography, based on laser technologies, by leading groups in the field. Print book: EnglishView all editions and formats Summary: Lithography is a complex tool based on the concept of imprinting an original template version onto mass output originally using relatively simple optical exposure, masking, and etching techniques, and now includes exposure to X-rays, high energy UV light, and electron beams in processes. This book covers the fundamental and latest status of all aspects of EUVL used in the field. Since , when SPIE Press published the first edition of EUVL Lithography, much progress has taken place in the development of EUVL as the choice technology for next-generation lithography. In , EUVL was a prime contender to replace nm-based.